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- W2077817967 abstract "Low k1 lithography process enables the production of 90nm and 65nm nodes by introducing advanced resolution enhancement technology (RET) mask with complex layout. To ensure the printed wafer outcome that meets the original IC design specifications, we need to consider the manufacturability and to verify it during design stage. This means that we need to characterize the process capabilities and use them as the input parameters to examine the upcoming design via simulation verification before mask making. For those of potentially weak or marginal layout design areas identified during the checking stage, we need to build a robust algorithm to improve the RET mask treatment process or to modify the design layout when necessary. This is the basic concept for Manufacturing Reliability Check & Correction (MRC2). In our implementation, MRC2 carries the wafer manufacturability information. By performing MRC2 during the design phase, we can better achieve the goal of Design for Manufacturing (DFM). In this paper, we present two example cases for a production worthy MRC2 - CPL (with two mask writing steps) and DDL (with two exposure masks). From our viewpoints, the first checking step needs to single out the weak printing spots or to map out the treated CPL/DDL features with unacceptable DOF and marginal exposure latitude. This allows using corrective actions to ensure a well-behaved printing of the entire chip during manufacturing. We recommend applying both MRC2 and electrical verification in the design verification loop iteratively until circuit performance prediction becomes satisfactory. The looping process generates useful feedback that adds to the RET knowledge database; hence, a more efficient DFM procedure." @default.
- W2077817967 created "2016-06-24" @default.
- W2077817967 creator A5006270033 @default.
- W2077817967 creator A5013622895 @default.
- W2077817967 creator A5042632952 @default.
- W2077817967 creator A5043014796 @default.
- W2077817967 creator A5055283353 @default.
- W2077817967 creator A5057793058 @default.
- W2077817967 creator A5072425828 @default.
- W2077817967 date "2004-12-06" @default.
- W2077817967 modified "2023-09-25" @default.
- W2077817967 title "Full-chip manufacturing reliability check and correction (MRC2): a first step toward design for manufacturability with low k 1 lithography" @default.
- W2077817967 doi "https://doi.org/10.1117/12.568670" @default.
- W2077817967 hasPublicationYear "2004" @default.
- W2077817967 type Work @default.
- W2077817967 sameAs 2077817967 @default.
- W2077817967 citedByCount "0" @default.
- W2077817967 crossrefType "proceedings-article" @default.
- W2077817967 hasAuthorship W2077817967A5006270033 @default.
- W2077817967 hasAuthorship W2077817967A5013622895 @default.
- W2077817967 hasAuthorship W2077817967A5042632952 @default.
- W2077817967 hasAuthorship W2077817967A5043014796 @default.
- W2077817967 hasAuthorship W2077817967A5055283353 @default.
- W2077817967 hasAuthorship W2077817967A5057793058 @default.
- W2077817967 hasAuthorship W2077817967A5072425828 @default.
- W2077817967 hasConcept C111919701 @default.
- W2077817967 hasConcept C117671659 @default.
- W2077817967 hasConcept C121332964 @default.
- W2077817967 hasConcept C127413603 @default.
- W2077817967 hasConcept C142362112 @default.
- W2077817967 hasConcept C149635348 @default.
- W2077817967 hasConcept C153349607 @default.
- W2077817967 hasConcept C163258240 @default.
- W2077817967 hasConcept C165005293 @default.
- W2077817967 hasConcept C200601418 @default.
- W2077817967 hasConcept C204223013 @default.
- W2077817967 hasConcept C2765594 @default.
- W2077817967 hasConcept C2777441419 @default.
- W2077817967 hasConcept C41008148 @default.
- W2077817967 hasConcept C43214815 @default.
- W2077817967 hasConcept C530198007 @default.
- W2077817967 hasConcept C62064638 @default.
- W2077817967 hasConcept C62520636 @default.
- W2077817967 hasConcept C74524168 @default.
- W2077817967 hasConcept C76155785 @default.
- W2077817967 hasConcept C78371743 @default.
- W2077817967 hasConcept C78519656 @default.
- W2077817967 hasConcept C98045186 @default.
- W2077817967 hasConceptScore W2077817967C111919701 @default.
- W2077817967 hasConceptScore W2077817967C117671659 @default.
- W2077817967 hasConceptScore W2077817967C121332964 @default.
- W2077817967 hasConceptScore W2077817967C127413603 @default.
- W2077817967 hasConceptScore W2077817967C142362112 @default.
- W2077817967 hasConceptScore W2077817967C149635348 @default.
- W2077817967 hasConceptScore W2077817967C153349607 @default.
- W2077817967 hasConceptScore W2077817967C163258240 @default.
- W2077817967 hasConceptScore W2077817967C165005293 @default.
- W2077817967 hasConceptScore W2077817967C200601418 @default.
- W2077817967 hasConceptScore W2077817967C204223013 @default.
- W2077817967 hasConceptScore W2077817967C2765594 @default.
- W2077817967 hasConceptScore W2077817967C2777441419 @default.
- W2077817967 hasConceptScore W2077817967C41008148 @default.
- W2077817967 hasConceptScore W2077817967C43214815 @default.
- W2077817967 hasConceptScore W2077817967C530198007 @default.
- W2077817967 hasConceptScore W2077817967C62064638 @default.
- W2077817967 hasConceptScore W2077817967C62520636 @default.
- W2077817967 hasConceptScore W2077817967C74524168 @default.
- W2077817967 hasConceptScore W2077817967C76155785 @default.
- W2077817967 hasConceptScore W2077817967C78371743 @default.
- W2077817967 hasConceptScore W2077817967C78519656 @default.
- W2077817967 hasConceptScore W2077817967C98045186 @default.
- W2077817967 hasLocation W20778179671 @default.
- W2077817967 hasOpenAccess W2077817967 @default.
- W2077817967 hasPrimaryLocation W20778179671 @default.
- W2077817967 hasRelatedWork W1556064588 @default.
- W2077817967 hasRelatedWork W1931823040 @default.
- W2077817967 hasRelatedWork W1980367469 @default.
- W2077817967 hasRelatedWork W1992153767 @default.
- W2077817967 hasRelatedWork W2050547267 @default.
- W2077817967 hasRelatedWork W2071618485 @default.
- W2077817967 hasRelatedWork W2077203087 @default.
- W2077817967 hasRelatedWork W2092731774 @default.
- W2077817967 hasRelatedWork W2011952937 @default.
- W2077817967 hasRelatedWork W2751358771 @default.
- W2077817967 isParatext "false" @default.
- W2077817967 isRetracted "false" @default.
- W2077817967 magId "2077817967" @default.
- W2077817967 workType "article" @default.