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- W2077854598 abstract "A general description of the relation between the sputtering rate and the deposition rate in plasma-assisted sputtering deposition has been developed. The equation derived yields the so-called Keller-Simmons [IBM J. Res. Dev. 23, 24 (1979)] formula in the limit of zero thermal gradients in the deposition system. It is shown that the Keller-Simmons formula can still be applied to fit the experimental results if the characteristic pressure-distance product, p0L0, is related to the temperature of the sputter cathode and the growing film. Using this relation, it is found that the variations in the values for p0L0 for different experimental conditions agree with the thus far not well understood experimental trends reported in the literature." @default.
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- W2077854598 date "2006-11-20" @default.
- W2077854598 modified "2023-10-14" @default.
- W2077854598 title "Generalized Keller-Simmons formula for nonisothermal plasma-assisted sputtering depositions" @default.
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- W2077854598 doi "https://doi.org/10.1063/1.2392830" @default.
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