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Matches in SemOpenAlex for { <https://semopenalex.org/work/W2077882759> ?p ?o ?g. }

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• W2077882759 abstract "The stress in molybdenum films deposited by dc magnetron sputtering in neon has been characterized. Fabrication of 1-μ-thick films 2 cm in diameter on polyimide membranes has been achieved with low-stress material. A reactive ion etching process is described with 75-nm resolution and 15:1 aspect ratios." @default.
• W2077882759 created "2016-06-24" @default.
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• W2077882759 date "1983-01-01" @default.
• W2077882759 modified "2023-10-16" @default.
• W2077882759 title "Deposition and reactive ion etching of molybdenum" @default.
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• W2077882759 doi "https://doi.org/10.1063/1.93743" @default.
• W2077882759 hasPublicationYear "1983" @default.
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