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- W2077961608 abstract "Optical characteristics of a new submicron ion probe system capable of covering a wide area have been investigated; the system is composed of two cylindrical gap lenses, dual octupole deflectors, and a liquid metal ion source. We qualitatively measured the focusing characteristics of this focused ion beam system equipped with a liquid Ga ion source, through scanning ion microscope image of Cu mesh, and through scanning electron microscope observation of the ion etched crater formed in a gold film deposited on silicon. We obtained the on-axis probe size of about 0.2 μm diam under the condition of an accelerating voltage of 15 kV and acceptance half-angle of 1 mrad, leading to a current density of about 1 A/cm2. We also measured deflection characteristics of the system, and from the scanning ion microscope image we confirmed that the on-axis probe size is almost unchanged even at a point 1 mm away from the axis by correcting astigmatism and field curvature. A microcomputer system has been developed for controlling the dual octupole deflector (including dynamic correction) and the ion dose by monitoring probe or source current." @default.
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- W2077961608 date "1986-01-01" @default.
- W2077961608 modified "2023-09-25" @default.
- W2077961608 title "Control electronics for a new submicron ion probe system" @default.
- W2077961608 doi "https://doi.org/10.1116/1.583366" @default.
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