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- W2078013500 endingPage "2996" @default.
- W2078013500 startingPage "2989" @default.
- W2078013500 abstract "Photolithography at 193 nm is a natural continuation of the progression from 436 to 365 to 248 nm in lithography, dictated by the requirement for continually higher resolution. It is anticipated that 193-nm lithography will enable 0.25-μm patterning in volume production with conventional masks, and 0.18-μm resolution with phase-shifting masks. The main issues related to lithography at this new wavelength are being addressed. It has been shown that highly transparent optical materials are available at 193 nm. Also, they are damaged by the laser radiation at a slow enough rate that high-quality projection optics are expected to perform within specifications for ten years of full-time operation. Consequently, a 193-nm step-and-scan system is being constructed, and it has been designed to attain 0.25-μm resolution over a 22 by 35 mm field. A range of 193-nm photoresist schemes has been demonstrated. They include semitransparent single-layer resists, positive-tone surface imaging (silylation), and negative-tone bilayers using ultrathin silicon-based polymers. In most instances we have demonstrated sub-0.25-μm resolution, high photosensitivity, good exposure–defocus latitude, and very low levels of etch residue. In sum, the first successful steps towards a fully engineered 193-nm photolithography have been taken, and no major obstacles are anticipated." @default.
- W2078013500 created "2016-06-24" @default.
- W2078013500 creator A5004265091 @default.
- W2078013500 date "1992-11-01" @default.
- W2078013500 modified "2023-10-16" @default.
- W2078013500 title "Photolithography at 193 nm" @default.
- W2078013500 cites W2058924168 @default.
- W2078013500 cites W2095500313 @default.
- W2078013500 cites W2489524916 @default.
- W2078013500 cites W2745904674 @default.
- W2078013500 cites W2057559547 @default.
- W2078013500 doi "https://doi.org/10.1116/1.585958" @default.
- W2078013500 hasPublicationYear "1992" @default.
- W2078013500 type Work @default.
- W2078013500 sameAs 2078013500 @default.
- W2078013500 citedByCount "26" @default.
- W2078013500 countsByYear W20780135002012 @default.
- W2078013500 countsByYear W20780135002014 @default.
- W2078013500 countsByYear W20780135002015 @default.
- W2078013500 countsByYear W20780135002016 @default.
- W2078013500 countsByYear W20780135002018 @default.
- W2078013500 countsByYear W20780135002019 @default.
- W2078013500 countsByYear W20780135002021 @default.
- W2078013500 crossrefType "journal-article" @default.
- W2078013500 hasAuthorship W2078013500A5004265091 @default.
- W2078013500 hasConcept C105487726 @default.
- W2078013500 hasConcept C120665830 @default.
- W2078013500 hasConcept C121332964 @default.
- W2078013500 hasConcept C134406635 @default.
- W2078013500 hasConcept C138268822 @default.
- W2078013500 hasConcept C14737013 @default.
- W2078013500 hasConcept C154945302 @default.
- W2078013500 hasConcept C162996421 @default.
- W2078013500 hasConcept C163581340 @default.
- W2078013500 hasConcept C171250308 @default.
- W2078013500 hasConcept C182873914 @default.
- W2078013500 hasConcept C192562407 @default.
- W2078013500 hasConcept C200274948 @default.
- W2078013500 hasConcept C204223013 @default.
- W2078013500 hasConcept C2779227376 @default.
- W2078013500 hasConcept C41008148 @default.
- W2078013500 hasConcept C41794268 @default.
- W2078013500 hasConcept C49040817 @default.
- W2078013500 hasConcept C53524968 @default.
- W2078013500 hasConcept C6260449 @default.
- W2078013500 hasConcept C94263209 @default.
- W2078013500 hasConceptScore W2078013500C105487726 @default.
- W2078013500 hasConceptScore W2078013500C120665830 @default.
- W2078013500 hasConceptScore W2078013500C121332964 @default.
- W2078013500 hasConceptScore W2078013500C134406635 @default.
- W2078013500 hasConceptScore W2078013500C138268822 @default.
- W2078013500 hasConceptScore W2078013500C14737013 @default.
- W2078013500 hasConceptScore W2078013500C154945302 @default.
- W2078013500 hasConceptScore W2078013500C162996421 @default.
- W2078013500 hasConceptScore W2078013500C163581340 @default.
- W2078013500 hasConceptScore W2078013500C171250308 @default.
- W2078013500 hasConceptScore W2078013500C182873914 @default.
- W2078013500 hasConceptScore W2078013500C192562407 @default.
- W2078013500 hasConceptScore W2078013500C200274948 @default.
- W2078013500 hasConceptScore W2078013500C204223013 @default.
- W2078013500 hasConceptScore W2078013500C2779227376 @default.
- W2078013500 hasConceptScore W2078013500C41008148 @default.
- W2078013500 hasConceptScore W2078013500C41794268 @default.
- W2078013500 hasConceptScore W2078013500C49040817 @default.
- W2078013500 hasConceptScore W2078013500C53524968 @default.
- W2078013500 hasConceptScore W2078013500C6260449 @default.
- W2078013500 hasConceptScore W2078013500C94263209 @default.
- W2078013500 hasIssue "6" @default.
- W2078013500 hasLocation W20780135001 @default.
- W2078013500 hasOpenAccess W2078013500 @default.
- W2078013500 hasPrimaryLocation W20780135001 @default.
- W2078013500 hasRelatedWork W1946880670 @default.
- W2078013500 hasRelatedWork W1967752359 @default.
- W2078013500 hasRelatedWork W1988961408 @default.
- W2078013500 hasRelatedWork W2007880660 @default.
- W2078013500 hasRelatedWork W2083608678 @default.
- W2078013500 hasRelatedWork W2115322984 @default.
- W2078013500 hasRelatedWork W2137146000 @default.
- W2078013500 hasRelatedWork W2363991779 @default.
- W2078013500 hasRelatedWork W2379570117 @default.
- W2078013500 hasRelatedWork W4353031986 @default.
- W2078013500 hasVolume "10" @default.
- W2078013500 isParatext "false" @default.
- W2078013500 isRetracted "false" @default.
- W2078013500 magId "2078013500" @default.
- W2078013500 workType "article" @default.