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- W2078103487 startingPage "4857" @default.
- W2078103487 abstract "Due to the need of relieving the strain associated with the formation of SiO2 precipitates in silicon, co-precipitation of carbon with oxygen in silicon wafers may involve a large number of atomic and point defect species: oxygen, carbon, vacancies, and silicon self-interstitials. This allows many parallel mechanisms for strain relief to occur. In the present paper we first reason that this complex system may be reduced to that involving only three species: oxygen, carbon, and self-interstitials; and the strain relief mechanisms may be limited to two: that via self-interstitials and that involving carbon. We then propose a dominant (strain relief species) flux criteria to explain the behavior of carbon and oxygen co-precipitation in silicon. When the carbon flux is dominant, carbon should co-precipitate with oxygen. When the silicon self-interstitial flux is dominant, carbon should not co-precipitate with oxygen, even at high concentrations. Available data, spanning the temperature range of 450-1000?C and a carbon concentration range of from less than 0.5?1016 to 1?1018 cm-3, can be explained using this criterion." @default.
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- W2078103487 date "1993-11-15" @default.
- W2078103487 modified "2023-10-14" @default.
- W2078103487 title "Co-Precipitation of Carbon and Oxygen in Silicon: The Dominant Flux Criterion" @default.
- W2078103487 doi "https://doi.org/10.1143/jjap.32.4857" @default.
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