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- W2078118493 abstract "Electron field-emission measurements of carbon films prepared by pulsed-laser deposition (PLD) and hot-filament chemical-vapor deposition (HF-CVD) are reported. Smooth PLD carbon films, with both high- and low-sp3 contents, appear to be poor field emitters. In contrast, HF-CVD carbon exhibits very good field-emission properties, including the emission turn-on field as low as 9 V/μm, high emission site density, and excellent durability. In addition, HF-CVD was carried out at temperatures below 600 °C, compatible with the use of glass substrates. The promising field-emission properties of HF-CVD carbon are attributed to the nanostructured nature of this material." @default.
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- W2078118493 date "1999-08-30" @default.
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- W2078118493 title "Field-emission studies of smooth and nanostructured carbon films" @default.
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- W2078118493 doi "https://doi.org/10.1063/1.124650" @default.
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