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- W2078137609 abstract "Summary form only given.Recently, an ion-implantation based technique, known as crystal ion slicing has been shown to yield single-crystal LiNbO/sub 3/ films on semiconductors and other platforms. In this technique, ion implantation is used to define a sacrificial layer which is then etched away in a dilute hydrofluoric acid solution. The thickness of the film is defined by the implantation energy. We report measurements of the electro-optical response of film and report on the techniques used to prepare the films and to emphasize their performance. We show that the electro-optic response of these films is comparable to that of single-crystal bulk, and is superior to values previously reported in the literature for polycrystalline films. Further the thin film geometry used has been shown to yield lower half-wave voltage for device operation." @default.
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- W2078137609 date "2000-01-01" @default.
- W2078137609 modified "2023-09-22" @default.
- W2078137609 title "Electro-optic modulation in single-crystal LiNbO/sub 3/ thin films" @default.
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- W2078137609 doi "https://doi.org/10.1109/cleo.2000.907485" @default.
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