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• W2078237151 abstract "A GaN distributed Bragg reflector (DBR) based on nanoporous GaN was fabricated by doping selective electrochemical etching. Twenty-one pairs of undoped-GaN/n-GaN were grown and only n-GaN was converted into a nanoporous layer during the etching. From spectral reflectance measurement, clear stopbands were observed, but the maximum reflectivity was limited to 87% at ∼450 nm in specular reflection geometry. It was attributed to significant scattering in the DBR caused by the non-uniform formation of nanopores. However, the diffuse reflectivity of nanoporous DBR was much higher (∼100%), which could be advantageous for a diffuse reflection mirror in a light-emitting diode." @default.
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• W2078237151 date "2013-07-01" @default.
• W2078237151 modified "2023-09-26" @default.
• W2078237151 title "High Diffuse Reflectivity of Nanoporous GaN Distributed Bragg Reflector Formed by Electrochemical Etching" @default.
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• W2078237151 doi "https://doi.org/10.7567/apex.6.072201" @default.
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