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- W2078308587 abstract "The reaction of the mobile interstitial Cu i atom and the A-center (vacancy-oxygen complex) was recently reported to produce at 350 K the rather stable Cu V O complex. Chemomechanical polishing in a copper-contaminated slurry allowed to lower the copper in-diffusion temperature down to 295K. The development of the Cu V O complex is shown to proceed via formation of the metastable precursor (Cu V O*) which introduces two deep levels in the lower half of the band gap. The Cu V O* defect is unstable at room temperature and transforms completely into the Cu V O complex by a 30 min anneal at 350 K. The proposed structure for the Cu V O* complex of a Cu i atom trapped nearby the A-center is supported by recent ab-initio calculations." @default.
- W2078308587 created "2016-06-24" @default.
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- W2078308587 date "2013-10-01" @default.
- W2078308587 modified "2023-09-26" @default.
- W2078308587 title "Metastable Cu<i>V</i>O* Complex in Silicon" @default.
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- W2078308587 doi "https://doi.org/10.4028/www.scientific.net/ssp.205-206.255" @default.
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