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• W2078355945 abstract "Abstract Atomic models of the intrinsic defects of amorphous SiO2 are used to review the following defect reactions: thermal generation and freezing in, atomic displacement during irradiation, photolysis by electron-hole recombination, bond rupture following charge trapping, and bond rupture during optical fibre drawing." @default.
• W2078355945 created "2016-06-24" @default.
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• W2078355945 date "1985-09-01" @default.
• W2078355945 modified "2023-09-26" @default.
• W2078355945 title "Defect mechanisms in a-SiO₂" @default.
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• W2078355945 doi "https://doi.org/10.1080/13642818508240608" @default.
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