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• W2078377163 abstract "We investigated the process of collision cascade propagation through the solid-vacuum boundary for two-component targets: WSi, MoSi and VSi. The surface mechanism of preferential sputtering of atoms of light component based on stronger deflection of light atoms towards surface normal when scattering by heavy neighbouring surface atoms during ejection was studied. Simulations for ejection of 450 000 Si or W atoms from the surface of WSi for cos ϑ0E02 and 1E02 initial distributions gave SiW sputtering ratio equal to 1.29–1.55 (for 1:1 SiW concentration ratio at the surface) giving necessary addition to the Andersen-Sigmund formula which underestimated that ratio in comparison with available experimental data. Analysis of integral energy distributions of atoms of the components gave SiW ratio maximum equal to 3.18–5.00 for energy interval 0.0–0.4 eV. Maxima of integral energy distributions of sputtered atoms were observed at 1.8 eV for Si and 3.4 eV for W in calculations with equal binding energies for atoms of light and heavy components in good agreement with experiment. The surface mechanism was shown to be the alternative mechanism in formation of observed maxima difference with respect to nonidentity of binding energy values for atoms of components proposed by Szymonski [Phys. Lett. A 82 (1981) 203]. The two-cone structure of ejection vs. initial polar angle for Si atoms sputtered was revealed and explained. Results obtained gave the new approach to solve the inverse problem of reconstruction of surface composition in low dose SNMS and showed that the surface mechanism of preferential sputtering is to be accounted for in analytical calculations of surface composition. Ejection was simulated in the plane containing the neighbouring surface atom." @default.
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• W2078377163 date "1996-09-01" @default.
• W2078377163 modified "2023-09-30" @default.
• W2078377163 title "Computer studies of the surface mechanism of preferential sputtering of two-component solids. Ion beam analysis of surface composition in low dose regime" @default.
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• W2078377163 doi "https://doi.org/10.1016/0168-583x(95)01479-9" @default.
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