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- W2078403162 abstract "Laser ablation of silicon surfaces with various dopant concentrations is studied by the irradiation of pulsed CO 2 laser. Silicon ions with the charge ranging from 1 to 4 au are observed in the emitted species. The fraction of the multiple charged ions increases with an increasing dopant concentration. The kinetic energy of Si ions, determined by the time-of-flight measurement, extends up to ∼300 eV, and is almost independent of the dopant concentration. The results can be explained by a positive charging of the irradiated spot during the laser irradiation." @default.
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- W2078403162 date "1998-05-01" @default.
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- W2078403162 title "Characteristics of the Species Ablated from Silicon Surface by Pulsed CO2Laser Irradiation" @default.
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- W2078403162 doi "https://doi.org/10.1143/jjap.37.2666" @default.
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