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- W2078511327 abstract "Abstract We describe here a unique lithography beamline that delivers x-rays using a flexible arrangement of two toroidal mirrors (one concave-concave and the other concave-convex), providing high spectral and spatial uniformity at the wafer plane. The image produced is a thin horizontal line, suitable for exposing a 25 by 50 mm field compatible with 0.25 μm VLSI. We also present the current status of the beamline being constructed at CXrl utilizing these optics." @default.
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- W2078511327 date "1991-03-01" @default.
- W2078511327 modified "2023-09-26" @default.
- W2078511327 title "Novel beamline optics for x-ray lithography" @default.
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- W2078511327 doi "https://doi.org/10.1016/0167-9317(91)90097-w" @default.
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