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- W2078543498 abstract "The authors report a highly flexible process for nanostructure lithography to incorporate specific functions in micro- and nanomechanical devices. The unique step involves electron beam patterning on top of released, resist-supported, surface micromachined structures, hence avoiding hydrofluoric acid etching of sensitive materials during the device release. The authors demonstrate the process by creating large arrays of nanomechanical torque magnetometers on silicon-on-insulator substrates. The fabricated devices show a thermomechanical noise-limited magnetic moment sensitivity in the range of 5 × 106 μB at room temperature and can be utilized to study both magnetostatics and dynamics in nanomagnets across a wide temperature range. The fabrication process can be generalized for the deposition and patterning of a wide range of materials on micro-/nanomechanical resonators." @default.
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- W2078543498 date "2013-09-01" @default.
- W2078543498 modified "2023-09-26" @default.
- W2078543498 title "Stiction-free fabrication of lithographic nanostructures on resist-supported nanomechanical resonators" @default.
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- W2078543498 doi "https://doi.org/10.1116/1.4821194" @default.
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