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- W2078602377 abstract "Highly tetrahedral, hydrogenated amorphous carbon (a-C:H) films have been deposited using rf sputtering of graphite by a magnetron sputter source in Ar/CH4 atmosphere. The deposition rate, the density and the structural properties of the deposited films were studied as a function of applied bias voltage on substrate during deposition. Optical emission spectroscopy was used to diagnose and monitor the plasma discharge. The film structure was studied using IR absorption spectroscopy. For all the films, the percentage of sp3 hydrogen bonding is higher than 80%. The atomic percentage of bonding hydrogen in the films is in the range 40-60% and increases when the applied bias voltage is increasing." @default.
- W2078602377 created "2016-06-24" @default.
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- W2078602377 date "2001-03-15" @default.
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- W2078602377 title "Influence of the substrate-electrode applied bias voltage on the properties of sputtered a-C:H thin films" @default.
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- W2078602377 doi "https://doi.org/10.1088/0953-8984/13/13/314" @default.
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