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- W2078658757 abstract "NiO-AZO films were deposited on glass substrate by DC and RF magnetron co-sputtering system in pure gas without substrate heating during deposition. In order to control the chemical composition of the film, NiO target was supplied with constant RF power of 150 W and AZO target (doped with 2.98 at% aluminum) with DC power varied between 40 W to 80 W. Deposited NiO-AZO films were evaluated by structural and chemical analysis. With introducing AZO, XRD and XPS data reveal that NiO were supplied with more oxygen. these results could be strongly affected by the higher bond enthalpy of NiO compared to ZnO, which makes it possible for NiO to obtain excessive oxygen from ZnO." @default.
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- W2078658757 date "2011-12-31" @default.
- W2078658757 modified "2023-09-23" @default.
- W2078658757 title "Fabrication and Characteristics of NiO-AZO Thin Films Deposited by Co-sputtering System for GaN LED Transparent Contact Electrode" @default.
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- W2078658757 doi "https://doi.org/10.5695/jkise.2011.44.6.250" @default.
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