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- W2078662458 abstract "In order to study the influence of the cooling condition of growing CZ‐Si crystals on gate oxide integrity (GOI) and the formation mechanism of the defects that deteriorate GOI, we have conducted growth‐halting experiments and heat‐ treatment experiments to simulate the cooling patterns of the growing crystals. We have found that GOI and the defect formation are strongly affected by the cooling condition in a critical temperature range around 1050°C." @default.
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- W2078662458 date "1996-10-01" @default.
- W2078662458 modified "2023-10-01" @default.
- W2078662458 title "Influence of Cooling Condition during Crystal Growth of CZ‐Si on Oxide Breakdown Property" @default.
- W2078662458 doi "https://doi.org/10.1149/1.1837216" @default.
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