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• W2078687620 abstract "An expression is derived for the mean thickness N99 of vapour-deposited thin films at the moment t99 of 99% substrate coverage. This quantity, characterizing the mean thickness at which thin films reach continuity, decreases with decreasing substrate temperature T and/or increasing deposition rate R. A formula is also obtained for t99 as a function of R and T. Based on the N99(R, T) dependence a growth diagram is constructed in coordinates 1n R versus 1/T and regions of high and variable and of low and constant N99 are determined. The island and normal modes of film growth are discussed and the critical values of R and T are found for the transition from high to low island growth of thin films deposited from vapour. The theoretical results are illustrated with existing experimental data on the deposition of gold on NaCl." @default.
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• W2078687620 date "1978-12-01" @default.
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• W2078687620 title "Mean thickness at which vapour-deposited thin films reach continuity" @default.
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• W2078687620 doi "https://doi.org/10.1016/0040-6090(78)90157-8" @default.
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