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- W2078751149 abstract "Selective metalorganic vapor phase epitaxy of GaAs within a finite area was investigated on (111)B substrate. The surface stoichiometry is determined based on surface photo-absorption measurement. High-temperature growth at 800 °C on stable GaAs (111)B and a cooling procedure with the (2×2)-like surface to improve flatness result in an intentionally step-free surface with device dimensions as wide as 8 μm on a selectively grown GaAs mesa." @default.
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- W2078751149 date "1996-10-21" @default.
- W2078751149 modified "2023-09-27" @default.
- W2078751149 title "Step‐free surface grown on GaAs (111)B substrate by selective area metalorganic vapor phase epitaxy" @default.
- W2078751149 doi "https://doi.org/10.1063/1.117735" @default.
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