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- W2078754603 abstract "Summary form only given. An electron cyclotron resonance (ECR) multicusp plasma source has been developed by using two ECR plasma production layers and multicusp plasma confinement. The effect of the length of the multicusp plasma chamber on the radial plasma uniformity has been investigated. It was found that the plasma chamber length can affect the initiation of discharges. The plasma source can be applied to thin film plasma processing" @default.
- W2078754603 created "2016-06-24" @default.
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- W2078754603 date "1990-01-01" @default.
- W2078754603 modified "2023-10-14" @default.
- W2078754603 title "Characteristics of an electron cyclotron resonance multicusp plasma source" @default.
- W2078754603 doi "https://doi.org/10.1109/plasma.1990.110709" @default.
- W2078754603 hasPublicationYear "1990" @default.
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