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• W2078778308 abstract "Abstract Optical waveguides may be formed in silica by an increase in refractive index resulting from a compaction of the glass network caused during radiation damage. An additional index enhancement had been ascribed to chemical changes during nitrogen implantation. The present work confirms this higher level of index enhancement of up to 4%. Measurements of the refractive index profile before and after annealing suggest that whereas electronically generated damage is annealed by 450°C, the changes in the region of the implanted nitrogen are stable. In the region of maximum nitrogen concentration the presence of a glass phase resembling silicon oxynitride is proposed. However a comparison of the refractive index profile with computer simulations of impurity and defect profiles suggests that radiation damage induced by nuclear collisions contributes to the refractive index profile even in the annealed samples." @default.
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• W2078778308 date "1986-09-01" @default.
• W2078778308 modified "2023-10-09" @default.
• W2078778308 title "Refractive index changes formed by N⁺ implants in silica" @default.
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• W2078778308 doi "https://doi.org/10.1080/00337578608206114" @default.
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