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• W2078802371 abstract "Volatile metalorganic compounds are finding an increasing application in the deposition of metals and semiconductors by metalorganic chemical vapour deposition (MOCVD). In this paper, the use of some new precursor systems in the growth of selected metals and alloys is reviewed with emphasis being placed on precursor chemistry in the gas phase and at the growth surface." @default.
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• W2078802371 date "1995-01-01" @default.
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• W2078802371 title "Recent developments in metalorganic precursors for metalorganic chemical vapour deposition" @default.
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• W2078802371 doi "https://doi.org/10.1016/0022-0248(94)00469-2" @default.
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