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• W2078904814 abstract "The annealing behavior of hole- and island-like nanostructures fabricated in situ in the scanning tunneling microscope on Si(1 1 1)7×7 has been investigated in the range from 720 to 830 K. In contrast to previous work, the analysis reveals diffusion-controlled decay kinetics to be described by a (t0−t)2/3 law. From the temperature dependence of the diffusion coefficient, we obtain an activation energy of (1.49±0.12) eV which is discussed in terms of a diffusion barrier for the moving adatoms. The comparison of the decay between hole and island structures suggest a missing Ehrlich–Schwoebel barrier for hole filling." @default.
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• W2078904814 date "2001-07-01" @default.
• W2078904814 modified "2023-09-25" @default.
• W2078904814 title "Scanning tunneling microscopy investigation at high temperatures of islands and holes on Si(111)7×7 in real time: evidence for diffusion-limited decay" @default.
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• W2078904814 doi "https://doi.org/10.1016/s0039-6028(01)01054-8" @default.
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