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• W2078952896 abstract "Abstract The purpose of this work was to deposit Zn-containing films on Si substrates using the commercial atmospheric pressure plasma jet “kINPen’09.” In preliminary experiments Zn-containing films were deposited on the silicon substrates immersed in water solutions of Zn(NO 3 ) 2 •6H 2 O salt. The surface composition of deposited films was analyzed by the XPS (X-ray photoelectron spectroscopy) technique while the bulk composition was studied by means of XRD (X-ray diffraction) mesurements. The film thickness was measured by a profilometer. We have determined that the concentration of the zinc nitrate solution as well as changes in the deposition time resulted in a large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed." @default.
• W2078952896 created "2016-06-24" @default.
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• W2078952896 date "2014-11-17" @default.
• W2078952896 modified "2023-10-10" @default.
• W2078952896 title "Deposition of Zn-containing films using atmospheric pressure plasma jet" @default.
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• W2078952896 doi "https://doi.org/10.1515/chem-2015-0020" @default.
• W2078952896 hasPublicationYear "2014" @default.
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