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• W2078961509 abstract "18O has been implanted at room temperature up to dosesof 4.4 × 1017/cm2 in a [100] Ni crystal. The implantation energy was 60 keV. Backscattering and channeling analyses at various implantation steps give evidence for oxygen migration towards the surface. After the overall implantation, X-ray analysis reveals the presence of NiO in epitaxy [100]//[100] with the substrate. Backscattering and channeling experiments tend to indicate that between the surface and Rp the sample is formed of NiO epitaxial crystallites and of pure nickel leading to a mean stoichiometry NiO0.75, constant in depth up to Rp. The misfit between the Ni and NiO lattice parameters induces strains and extended defects formation. Between Rp and Rp + ΔRp the oxygen concentration decreases, and the channeling results show no preferential direction. This region corresponds probably to a highly disordered NiO alloy. This hypothesis is confirmed by annealing experiments: the oxygen present between Rp and Rp+ΔRp migrates towards the surface at 400°C and a reordering of this region is observed. There is also an improvement of the structural quality of the NiO crystallites." @default.
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• W2078961509 date "1981-04-01" @default.
• W2078961509 modified "2023-10-18" @default.
• W2078961509 title "Formation of epitaxial NiO by Oxygen implantation in [100] Ni" @default.
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• W2078961509 doi "https://doi.org/10.1016/0029-554x(81)90704-7" @default.
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