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• W2078984816 abstract "Selective-area atomic layer deposition (ALD) was studied using poly(vinyl pyrrolidone) (PVP) films as growth-preventing mask layers. The PVP films were prepared by spin coating and patterned by UV lithography. The PVP films were tested in several ALD processes: iridium, platinum, ruthenium, , and . The deposition temperatures were . In general, the PVP film passivated the surface against the noble metal processes, but the oxide films grew on PVP. However, the oxide films did not grow through the PVP film on the substrate surface and, therefore, the films could still be patterned, though with more of a lift-off method rather than with pure selective-area ALD." @default.
• W2078984816 created "2016-06-24" @default.
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• W2078984816 date "2010-01-01" @default.
• W2078984816 modified "2023-10-02" @default.
• W2078984816 title "Selective-Area Atomic Layer Deposition Using Poly(vinyl pyrrolidone) as a Passivation Layer" @default.
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• W2078984816 doi "https://doi.org/10.1149/1.3250936" @default.
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