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- W2079074519 abstract "A method is described for measuring transmittance, reflectance, and loss spectra in thin optical films. The method is applied to measure the properties of multilayer coatings of Si and SiO2 used to make mirrors and antireflection coating in the 1.0–1.7-μm wavelength region. Mirrors with reflectance up to 99.5% with nine quarter-wavelength layers and two-layer antireflection coatings with reflectance of <0.2% have been made." @default.
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- W2079074519 date "1990-02-01" @default.
- W2079074519 modified "2023-09-27" @default.
- W2079074519 title "Reflectance, transmittance, and loss spectra of multilayer Si/SiO_2 thin film mirrors and antireflection coatings for 15 μm" @default.
- W2079074519 cites W2014289558 @default.
- W2079074519 doi "https://doi.org/10.1364/ao.29.000583" @default.
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