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- W2079079911 abstract "The authors describe a lithographic method based on a scanning probe technique to selectively remove octadecylphosphonic acid (OPA) molecules from their self-assembled monolayers (SAMs) spin coated on a Si substrate. This lithographic technique involves the use of a positively biased probe tip to scan an OPA SAM having a thickness of ∼2nm and provides an opportunity for developing a scanning probe based lithography that accommodates the need for ever-decreasing size of semiconductor devices." @default.
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- W2079079911 date "2007-05-14" @default.
- W2079079911 modified "2023-09-23" @default.
- W2079079911 title "Nanolithography of a full-coverage octadecylphosphonic acid monolayer spin coated on a Si substrate" @default.
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- W2079079911 doi "https://doi.org/10.1063/1.2741119" @default.
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