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• W2079132458 abstract "Hydrogenated amorphous silicon carbon (a-SiC:H) films were deposited by hot wire chemical vapor deposition. The evolution of microscopic properties like network bonding, disorder, density and chemical composition are studied as a function of H2 dilution. The sp^2 and sp^3 carbon clusters, hydrogen content and the density of the material has significant effect on the dielectric properties like the leakage current of M/a-SiC:H/ MIS structures made with both Cu and Al metal electrode. A higher leakage current is observed in the case of Cu electrode. These changes are important for its applicability as a low dielectric constant barrier material in microelectronic devices." @default.
• W2079132458 created "2016-06-24" @default.
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• W2079132458 date "2006-01-01" @default.
• W2079132458 modified "2023-10-14" @default.
• W2079132458 title "Microscopic properties of H2 diluted HWCVD deposited a-SiC:H film" @default.
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• W2079132458 doi "https://doi.org/10.1016/j.mee.2005.10.024" @default.
• W2079132458 hasPublicationYear "2006" @default.
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