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• W2079150880 abstract "In this paper, we use Auger electron spectroscopy and electron energy-loss spectroscopy in order to investigate the room-temperature formation of the Ti/SiO2 interface and its reactivity upon annealing. We perform anneals in the temperature range 200–900 °C for which the phenomena involved are discussed with respect to the Si oxide and Ti film thicknesses." @default.
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• W2079150880 date "1991-06-15" @default.
• W2079150880 modified "2023-09-26" @default.
• W2079150880 title "An Auger and electron energy-loss study of reactions at the Ti-SiO2 interface" @default.
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• W2079150880 doi "https://doi.org/10.1063/1.347472" @default.
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