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• W2079169504 abstract "An assessment is made of the effects of atomic mixing and electron range on the profile shape and interface resolution measured in the composition depth profiling of elemental layers on elemental substrates, using Auger electron spectroscopy. A practical method is derived for extracting these two parameters. For compound overlayers, preferential sputtering and pileup effects are included and this can sharpen the interface, as demonstrated by measurements in the Ta2O5/Ta system. The profiles for oxygen show resolutions of 1.41±0.07 nm at 28.4 nm and 1.74±0.10 nm at 96.3 nm. These resolutions involve atomic mixing contributions of 0.66 and 0.83 nm, respectively, in close agreement with the predictions of Lindhard, Scharff, and Schio/tt’s theory." @default.
• W2079169504 created "2016-06-24" @default.
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• W2079169504 date "1984-10-01" @default.
• W2079169504 modified "2023-10-01" @default.
• W2079169504 title "Atomic mixing and electron range effects in ultrahigh-resolution profiles of the Ta2O5/Ta interface by argon sputtering with Auger electron spectroscopy" @default.
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• W2079169504 doi "https://doi.org/10.1063/1.334209" @default.
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