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- W2079176903 abstract "500 keV and 900 keV Xe+, 400 keV Er+ and 400 keV Tm+ were implanted into potassium titanyl phosphate (KTiOPO4 or KTP) at room temperature. The fluences were 1×1016 ions/cm2, 1×1015 ions/cm2 and 2×1015 ions/cm2, respectively, for Xe+, Er+ and Tm+ ions. In order to observe the effect of H ions on the Er+ diffusion in KTiOPO4, the sample implanted with 400 keV Er+ was irradiated by 50 keV H+ to a fluence of 4×1016 ions/cm2. The KTiOPO4 samples were annealed at different temperatures in ambient N2. Rutherford backscattering of MeV He ions was used to study the diffusion behavior of Xe+, Er+ and Tm+ in KTiOPO4. The results show that: (1) for the case of 500 keV and 900 keV Xe+, the implanted ions have redistributed and some have been lost after 600°C, 700°C and 800°C annealing; (2) for the case of 400 keV Er+ followed by 50 keV H+, implanted Er+ ions have an asymmetric distribution and a long tail extending towards the deep side after 800°C annealing, most of them moved to the surface; (3) for the case of 400 Tm+, no obvious diffusion behavior was observed after 800°C annealing." @default.
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- W2079176903 date "2000-06-01" @default.
- W2079176903 modified "2023-10-18" @default.
- W2079176903 title "Diffusion of heavy ions in KTiOPO4" @default.
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- W2079176903 doi "https://doi.org/10.1016/s0257-8972(00)00612-5" @default.
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