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• W2079185952 abstract "Silica xerogels doped with Ge(IV), substituting for Si(IV) in the oxide network, are prepared from tetraethylorthosilicateand germanium-tetraethoxide. The sintering process is carried out in reducing atmosphere at 700 - 900° C by reactionwith H 2 . Raman spectroscopy and high resolution transmission electron microscopy (TEM) show that reactions with H 2 give rise, in the porous silica network, to uncontrolled islands of crystallites of elemental cubic germanium with average size of 50 nm. Sintering process in reducing H 2 atmosphere at temperatures just below the phase separation, at about 610°C, gives materials where Ge atoms are dispersed in the matrix in conditions of incipient clustering. Evidences of segregation of germanium nanocrystals are observed with electron irradiation during TEM analysis. Furthermore, theelectron beam induced precipitation leads to the formation of isolated quantum dots-like nanocrystals (5-6 nm indiameter) and with narrower size dispersion. The ranges of suitable temperature and germanium concentration are analysed, as well as the size dispersion of the resulting Ge nanophases." @default.
• W2079185952 created "2016-06-24" @default.
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• W2079185952 date "2008-08-28" @default.
• W2079185952 modified "2023-09-23" @default.
• W2079185952 title "Ge nanoparticles growth in Ge-doped sol-gel silica by e-beam exposure" @default.
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• W2079185952 doi "https://doi.org/10.1117/12.793310" @default.
• W2079185952 hasPublicationYear "2008" @default.
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