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- W2079205237 abstract "Tungsten silicide (WSii) films were prepared by rapid thermal annealing (RTA) of W films obtained by chemical vapor deposition (CVD) from carbonyl precursor—W(CO)6. The RTA process proceeds at 800–1400°C in different gas environments—argon, nitrogen, vacuum, etc. Investigations of the crystal phase structure were performed by Reflection High Energy Electron Diffraction (RHEED) method. Difference in the phase composition was observed for thin and thick WSi2. Close to the surface of W films, a pure metal rich phase is formed, and at the interface WSi, a phase rich of Si is found. Diffusion was considered to be the controlling process in the kinetics formation of WSi2. The influence of the gas environment on WSi2 was also studied. The comparison made shows that nitrogen favours WSi2 formation. Some of the samples have shown a certain degree of texturing." @default.
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- W2079205237 date "1998-10-01" @default.
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- W2079205237 title "Preparation of WSI2 by rapid thermal annealing of CVD thin films of tungsten" @default.
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- W2079205237 doi "https://doi.org/10.1016/s0042-207x(98)00155-9" @default.
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