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- W2079231691 abstract "Two-dimensional diffusion of aluminum implanted through a mask in silicon has been measured after furnace or rapid thermal annealings. Chemical staining on cross-sectioned samples was used to determine both the vertical and the lateral function depths. The spreading resistance standard procedure was adopted to measure the vertical profiles while a new procedure was developed for the determination of the lateral diffusion profiles. The difference in the measured profile by staining and spreading resistance is related to the spilling phenomenon that distorts the carrier concentration profile on beveled samples. Moreover, experimentally aluminum diffusion parameters and segregation coefficient at the Si/SiO 2 interface have been introduced in advanced one-dimensional (SUPREM III) and two-dimensional (SUPREM IV) process simulators. The good agreement between the simulated and the experimental data, for both the lateral and the vertical directions, indicates that these process simulators can reproduce with accuracy the aluminum diffusion" @default.
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- W2079231691 date "1995-05-01" @default.
- W2079231691 modified "2023-09-25" @default.
- W2079231691 title "Two‐Dimensional Aluminum Diffusion in Silicon: Experimental Results and Simulations" @default.
- W2079231691 doi "https://doi.org/10.1149/1.2048617" @default.
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