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- W2079242008 abstract "Abstract We present a simple growth of highly aligned silicon nanocones by using bias-enhanced microwave plasma CVD of gas mixture of hydrogen and methane. SiO 2 and nickel films were used as a silicon precursor and a seeding material for patterning cone structure, respectively. SEM studies showed that the nanocones have nanometer-size tips and sub micrometer-size bases. TEM analysis revealed that the nanocones have amorphous structure with nickel on the tips. The model for formation of silicon nanostructures will also be suggested." @default.
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- W2079242008 date "2007-02-01" @default.
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- W2079242008 title "Fabrication of amorphous silicon nanocones by bias-enhanced microwave plasma CVD" @default.
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