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- W2079283011 abstract "HfO{sub 2} films were deposited onto a Si(100) substrate using an alternate reaction of HfCl{sub 4} and O{sub 2} under atmospheric pressure. Self-limiting growth of the HfO{sub 2} was achieved in the range of the growth temperature above 873K. The X-ray diffraction of the HfO{sub 2} films showed a typical diffraction pattern assigned to the monoclinic polycrystalline phase. Residual chloride concentration in HfO{sub 2} films were not higher than 0.1at%. When the growth temperature was 973K, the HfSiO{sub x} is formed in HfO{sub 2} film. This gives effective permittivity value of 9.6 for the HfO{sub 2} film grown at 573K." @default.
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- W2079283011 date "2004-11-01" @default.
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- W2079283011 title "Growth of HfO2 films using an alternate reaction of HfCl4 and O2 under atmospheric pressure" @default.
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- W2079283011 doi "https://doi.org/10.1016/j.jssc.2004.07.029" @default.
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