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- W2079291121 abstract "We have designed and constructed an experimental tool for projection electron-beam lithography with demagnification imaging (PELDI).The tool was built to analyze the efficacy of this approach as an alternative to photolithography for future integrated circuit manufacturing. In this paper, we first introduce how to modify a transmission electron microscope into a PELDI tool. Then, we study the transmission and contrast of the mask through experiments and Monte Carlo simulation. The simulation is intended to help select the optimum materials and the thickness for use in a scattering mask. In addition, we will discuss some phenomena, such as the charging effect in the mask during exposure." @default.
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- W2079291121 date "2002-07-01" @default.
- W2079291121 modified "2023-09-26" @default.
- W2079291121 title "Mask characteristics for projection electron-beam lithography with demagnification imaging" @default.
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- W2079291121 doi "https://doi.org/10.1016/s0167-9317(02)00533-6" @default.
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