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- W2079398770 abstract "A method for thick film photoresist resolution enhancement was investigated which involves treatment of photoresist films with solutions of cationic surfactants prior to development. By utilizing a surfactant surface treatment process, resist contrast is improved and better image resolution can be achieved. The effectiveness of the surfactant treatment is dependent on a number of factors including structure and concentration of surfactant, pH of the solution, mode and duration of treatment, and effect of other additives. The mechanism of the process has been investigated and the results suggest that the critical factors are the attachment of the surfactant to the top surface of the resist and the detachment of surfactant depending on film acid concentration." @default.
- W2079398770 created "2016-06-24" @default.
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- W2079398770 date "1995-06-09" @default.
- W2079398770 modified "2023-09-23" @default.
- W2079398770 title "<title>Thick film photoresist resolution enhancement with surfactant surface treatment</title>" @default.
- W2079398770 doi "https://doi.org/10.1117/12.210365" @default.
- W2079398770 hasPublicationYear "1995" @default.
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