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- W2079447002 abstract "The dopant diffusion barrier property of a chemically grown oxide (CGO) film has been characterized in polysilicon. The CGO film was grown by immersion of an amorphous Si film in a mixture of , , and liquids, heated to . The CGO film behaves as a superior dopant diffusion barrier compared to a thermally grown oxide (TGO) film. Composition analysis shows the CGO film has 0.4 atom % N while the TGO has no detectable N. The superior barrier property of the thinner CGO film is attributed to N incorporation." @default.
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- W2079447002 date "2006-02-01" @default.
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- W2079447002 title "Dopant Diffusion Barrier Properties of Ultrathin, Chemically Grown Oxide Films" @default.
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- W2079447002 doi "https://doi.org/10.1149/1.2146705" @default.
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