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• W2079474014 abstract "Abstract An innovative concept in the development of advanced coating deposition and ion implantation method including an application of filtered DC metal plasma source and high-frequency short-pulsed negative bias voltage with a duty factor in the range 10–99% are considered. The regularities of ion implantation and metal plasma deposition for metal and dielectric samples are experimentally investigated. Experimentally, it has been shown that metal plasma-based ion implantation, high-concentration metal plasma ion implantation with compensation of ion surface sputtering by metal plasma deposition and ion-assisted coating deposition can be realized by variation of bias potential ranging from 0 V to 4 kV, with pulse repetition rate smoothly adjusted in the range (2–4.4)×10 5  pps and pulse duration ranging from 0.5 to 2 μs. Special features of the material treatment method depending on plasma concentration, pulse repetition rate and duty factor have been examined." @default.
• W2079474014 created "2016-06-24" @default.
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• W2079474014 date "2005-05-01" @default.
• W2079474014 modified "2023-09-23" @default.
• W2079474014 title "Development of filtered DC metal plasma ion implantation and coating deposition methods based on high-frequency short-pulsed bias voltage application" @default.
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• W2079474014 doi "https://doi.org/10.1016/j.vacuum.2005.01.046" @default.
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