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- W2079480986 abstract "We demonstrate the fabrication of sub — 5 nm NiCr wires using conventional 100 kV electron beam lithography and PMMA resist technology. The wires are short, and widen to continuous 20 nm wires at either end. The ultra high resolution is achieved using a novel exposure technique. These wires are believed to be the smallest features yet made using this technology." @default.
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- W2079480986 date "1996-01-01" @default.
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- W2079480986 title "3 nm NiCr wires made using electron beam lithography and PMMA resist" @default.
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- W2079480986 doi "https://doi.org/10.1016/0167-9317(95)00278-2" @default.
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