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- W2079579984 abstract "Abstract Copper‐ and silver‐based oxides were deposited on glass and silicon substrates by reactive sputtering in various Ar/O 2 mixtures. The deposition conditions range for paramelaconite synthesis is discussed. The structure of silver oxide films is discussed as a function of the oxygen flow rate introduced into the deposition chamber. Ag/Cu/O films were deposited using either co‐sputtering of silver and copper targets or sputtering of composite targets (Ag 50 Cu 50 and Ag 60 Cu 40 ). The control of the oxygen and/or the silver content allows the formation of various kinds of structures: X‐ray amorphous, metal/oxide nanocomposites or silver/copper oxides. Finally, the effect of copper and/or manganese addition in silver‐based oxides on their thermal stability is presented. magnified image" @default.
- W2079579984 created "2016-06-24" @default.
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- W2079579984 date "2009-07-14" @default.
- W2079579984 modified "2023-09-25" @default.
- W2079579984 title "Structure Control in Reactively Sputtered Ag/Cu/(Mn)/O Films" @default.
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- W2079579984 doi "https://doi.org/10.1002/ppap.200930001" @default.
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