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- W2079586537 abstract "IR-ATR and IR transmission spectra of photo-CVD SiO 2 on Si have been measured to characterize the effect of F 2 treatment on the interface formation. IR-ATR spectra show that the Si-H bonds at the interface are reduced remarkably by the F 2 treatment. This reduction effect depends on the growth temperature, and the dependence is qualitatively similar to that of the interface states. IR transmission and XPS spectra show that the residual F in the SiO 2 /Si structure is not bonded to Si. It is considered from these measurements that the F 2 treatment activates the Si surface to form tight Si-O bonds." @default.
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- W2079586537 date "1990-05-01" @default.
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- W2079586537 title "Infrared Characterization of Interface State Reduction by F<sub>2</sub> Treatment in SiO<sub>2</sub>/Si Structure using Photo-CVD SiO<sub>2</sub> Film" @default.
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- W2079586537 doi "https://doi.org/10.1143/jjap.29.l687" @default.
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