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• W2079631901 abstract "An in‐line mass spectrometer and Langmuir probes have been employed to examine mechanisms of plasma immersion hydrogen passivation of grain boundary defects in polycrystalline silicon thin film transistors. Relative fluxes of H+ and H+2 as well as total ion current density were measured at the substrate location in an electron cyclotron resonance hydrogen discharge. Measurements were made over a range of operating conditions over which passivation rates have been shown to vary dramatically. Data presented show a strong correlation of both H+ flux and ion bombardment energy with good transistor performance obtained at operating pressures below 1 mTorr. This suggests that discharge operating conditions that promote dissociation of H2 to form H and H+ (which may diffuse more rapidly through solid material than H2), as well as increased sheath voltages and therefore ion energy at the substrate, are important to obtaining acceptable process rates." @default.
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• W2079631901 date "1995-11-20" @default.
• W2079631901 modified "2023-10-09" @default.
• W2079631901 title "Mechanisms for polycrystalline silicon defect passivation by hydrogenation in an electron cyclotron resonance plasma" @default.
• W2079631901 doi "https://doi.org/10.1063/1.114877" @default.
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