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- W2079647550 abstract "This paper describes the effect of aluminium diffusion into and annealing of polycrystalline silicon on the grain boundary traps. It has been shown that diffusion of aluminium at 700°C followed by annealing at a moderately higher temperature of about 450°C reduces the density of trap states at the grain boundaries considerably." @default.
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- W2079647550 date "1993-08-01" @default.
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- W2079647550 title "Combined effect of aluminium diffusion and annealing on GB properties in cast polysilicon" @default.
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- W2079647550 doi "https://doi.org/10.1016/0927-0248(93)90139-t" @default.
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