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- W2079651772 abstract "Ion sputtering of W, Al, and Be (in several experiments) in a low pressure DC discharge in D2/O2 mixtures was studied. Ion energy was varied by electrical biasing of the samples from −100 to −600 V with respect to the plasma. At a bias of −100 V the sputtering yields peaked with an addition of 2–4 mol.% oxygen reaching (4 ± 0.5) × 10−3, (12 ± 1) × 10−3, and (20 ± 2) × 10−3 Me at./ion for W, Al, and Be, respectively. It is supposed that chemical nature of W, Al, and Be sputtering in D2/O2 plasma is caused by formation of weakly bound surface oxides and hydroxides under impinging of reactive deuterated ions (D3O+, D3+)." @default.
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- W2079651772 date "2015-08-01" @default.
- W2079651772 modified "2023-09-25" @default.
- W2079651772 title "Sputtering of W and Al in D2/O2 plasma cleaning discharge" @default.
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- W2079651772 doi "https://doi.org/10.1016/j.jnucmat.2014.12.059" @default.
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