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- W2079670037 abstract "The influence of deposition conditions on the electrical characteristics of SnO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>x</sub> thin films deposited by direct current (DC) sputtering is presented in this paper. The influence of deposition process on the transition conditions between p-type and n-type SnO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>x</sub> thin films is systematically investigated for the first time. The results show that with the increase of oxygen partial pressure, depositing temperature and DC power, the conduction type of SnO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>x</sub> thin film switches from p-type to n-type. An n-type SnO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>x</sub> TFT is then successfully fabricated based on obtained conditions of the n-type SnO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>x</sub> thin film." @default.
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- W2079670037 date "2014-07-01" @default.
- W2079670037 modified "2023-10-16" @default.
- W2079670037 title "Study on the transition between p and n types of SnO<inf>x</inf> film deposited by DC sputtering" @default.
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- W2079670037 doi "https://doi.org/10.1109/am-fpd.2014.6867138" @default.
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