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• W2079751550 abstract "Bismuth thin films in the thickness range from 10 to 200 nm were deposited on glass substrates by thermal evaporation. The films were investigated by electron microscopy and X-ray diffraction. No anomalous dependence of the structural features on the film thickness was observed but only a normal monotonic variation. All the samples were polycrystalline with a high degree of preferred orientation. The [0001]H or [111]R fibre texture was against heat treatment. The residual strain decreased abruptly with increasing thickness up to 30 nm while the grain size increased up to a thickness of 100 nm and then exhibits almost no further change. The substructure within the individual grain, such as twining and/or stacking faults, was considered on the basis of the large values of grain size revealed by direct observation with transmission electron microscopy compared with those obtained from X-ray diffraction line profile analysis. A structure-properties (electrical) intercorrelation was proved." @default.
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• W2079751550 date "1992-03-01" @default.
• W2079751550 modified "2023-09-26" @default.
• W2079751550 title "Size-dependent structural characteristics of thin bismuth films" @default.
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• W2079751550 doi "https://doi.org/10.1016/0040-6090(92)90006-w" @default.
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